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Ocean Optics Introduces Real-time Plasma Monitor

System is Ideal for Monitoring Plasma Processes Used in Deposition and Etching Applications

Dunedin, Fla., June 2004 –Now available from the Ocean Analytics Division of Ocean Optics is the PlasCalc-2000 Plasma Monitor, a real-time spectrophotometric system for monitoring and controlling plasma processes from 200-1100 nm. Included is a powerful software feature -- the Recipe Editor -- that allows users to build their own plasma recipe libraries for applications such as measuring film deposition, monitoring etching processes and examining surface cleaning.

The PlasCalc-2000 Recipe Editor is a versatile tool that allows users to control plasma processes. For example, users can set programmable wavelength-specific energy tolerances to control the most difficult process conditions: multi-stack etches and trenches, film deposition, plasma etching, surface cleaning, chamber health control, and control of abnormal process phenomena. Also available are an integrated formula editor for convenient access to mathematical and algorithmic functions, an emission wavelength library for species identification, and a wavelength editor to optimize signal-to-noise performance.

Hardware features of the PlasCalc-2000 -- all integrated into one compact package -- include a USB interface for PC control, four analog outputs and eight digital TTL inputs/outputs, fiber optic coupling to the chamber view port via optical fiber or a vacuum feedthrough, and an Ocean Optics Composite-grating Spectrometer. 

Additional software features enable automatic data storage, monitor and observe plasma kinetics, identify emission lines, and characterize particle density.  An option called SpecLine is available for finding specific emission lines; comparing spectral data; and identifying unknown peaks, atomic lines and molecular bands.

 

 


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