Dunedin, Fla., June 2004 –Now available from the Ocean Analytics Division of Ocean
Optics is the PlasCalc-2000 Plasma Monitor, a real-time spectrophotometric
system for monitoring and controlling plasma processes from 200-1100 nm.
Included is a powerful software feature -- the Recipe Editor -- that
allows users to build their own plasma recipe libraries for applications
such as measuring film deposition, monitoring etching processes and
examining surface cleaning.
The PlasCalc-2000 Recipe Editor is a versatile tool that
allows users to control plasma processes. For example, users can set
programmable wavelength-specific energy tolerances to control the most
difficult process conditions: multi-stack etches and trenches, film
deposition, plasma etching, surface cleaning, chamber health control, and
control of abnormal process phenomena. Also available are an integrated
formula editor for convenient access to mathematical and algorithmic
functions, an emission wavelength library for species identification, and
a wavelength editor to optimize signal-to-noise performance.
Hardware features of the PlasCalc-2000 -- all integrated into
one compact package -- include a USB interface for PC control, four analog
outputs and eight digital TTL inputs/outputs, fiber optic coupling to the
chamber view port via optical fiber or a vacuum feedthrough, and an Ocean
Optics Composite-grating Spectrometer.
Additional software features enable automatic data storage,
monitor and observe plasma kinetics, identify emission lines, and
characterize particle density. An
option called SpecLine is available for finding specific emission lines; comparing spectral
data; and identifying unknown peaks, atomic lines and
molecular bands.