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Thin Film Reference
Wafer
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When
measuring the thickness of substrates such as silicon wafers or optical
layers, consider our Silicon-Silicon Dioxide (Si-SiO2)
Reference Wafer. Available for $792, the REFERENCE
is a 9.8-cm diameter, 6-step wafer that has a calibrated thickness
range of 0-500 nm, and is ideal for use as a reference standard when
measuring the thickness of thin, transparent layers on different
substrates.
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The Reference Wafer consists of a thin
wafer of silicon dioxide on silicon, with each transparent step numbered
and etched on the wafer surface. A calibration data sheet -- the
wafer is calibrated using an ellipsometer -- includes for each step
information such as the X and Y positions, ψ, δ,
period (in mm) and thickness (in mm).
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Contact an Ocean Optics Applications Scientist
Variable-angle
Reflection Sampling System
Reflection
Stage
Reflection and
Transmission Stage
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