The Challenges in

Semiconductor
Manufacturing

Unplanned downtime and yield loss during plasma processes

Inconsistent process repeatability across etch and deposition steps

Difficulty detecting endpoint or plasma drift in real time

Tight integration requirements inside existing process tools

What You Measure:
Real‑time plasma emission spectra during etching or deposition.

What You Learn:
Clear spectral signals that indicate process completion.

Why It Matters:
Reduces over processing, improves cycle consistency, and lowers process risk.

What You Measure:
Continuous changes in plasma emission behavior.

What You Learn:
Process drift, instability, or variation as it occurs.

Why It Matters:
Supports tighter process control without disrupting existing tool architectures.

Closed systems force you to adapt your process around the instrument. Ocean Optics takes the opposite approach. Our spectroscopy solutions are designed to fit into your tool architecture, your control environment, and your performance targets.

  • Flexible by design – Configure wavelength range, resolution, optics, and accessories around your specific process signals.
  • Built for integration – Compact, modular components designed for OEM integration and existing tool environments.
  • Open-platform control – Use OceanDirect™ SDK for full software and automation control.
  • Scale without re-platforming – Move from R&D to production using the same ecosystem. No need to redesign your sensing approach.
  • Cost aligned to the application – Build exactly what you need, without paying for fixed-system limitations or unnecessary complexity.

Closed systems force you to adapt your process around the instrument. Ocean Optics takes the opposite approach. Our spectroscopy solutions are:

  • Designed to fit into your tool architecture, your control environment, and your performance targets
  • Delivered into a global process control OEM, embedding high-resolution spectroscopy into overlay metrology systems.
  • Integrated directly into semiconductor process control equipment
Semiconductor

Selecting the ideal spectroscopy system requires balancing precision with practical integration.

To find the solution that best fits your specific application, consider how these critical technical factors align with your operational goals.

What plasma signals are critical to your process?

Which wavelength range is required for reliable emission monitoring?

How will OES integrate into your existing tool architecture or control flow?